To realize nano scale x-ray imaging on a benchtop scale without highly specialized and costly x-ray optical componenets, we are developing an amplified photoresist film that is sensitive to x-ray and electron beam radiation, and can support nanometer scale features. These features are read accurately quantified by a compact atomic force microscopy. We have achieved initial success in a gold amplified E-beam resist system and obtained radiographs of x-ray gratings at 50 nm resolution. The amplification by a gold photo-conversion layer reduced the required x-ray energy by a factor of 45.
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|Gomella, Andrew; Martin, Eric W; Lynch, Susanna K et al. (2013) Low dose hard x-ray contact microscopy assisted by a photoelectric conversion layer. AIP Adv 3:42121|