Chemical vapor deposition (CVD) methods have become important for the manufacture of technologically-significant thin films. Many important materials are synthesized by this general family of techniques, including semiconducting and insulating films, and diamond films for wear hardening and optical uses. This project is a multidisciplinary collaborative effort designed to study growth mechanisms of CVD of diamond and related films. Recent measurements have demonstrated that the morphology of CVD grown diamond films is very sensitive to activation and growth conditions. In order to rationally control the growth process a link is necessary between the structure of the films produced and the chemistry that is taking place in the growth reactor. To address this, three aspects of the CVD growth process are explored: identification of the gas phase species present in the boundary layer above the substrate, determination of the species present on the substrate surface and surface of the grown film, and structural determination of the film morphology. Laser ionization and secondary ion mass spectrometries, surface vibrational spectroscopy, and electron and optical microscopies will be used for these determinations. The results from these studies are expected to contribute to development of a fundamental understanding of how gas-phase and surface chemistry influence the composition, growth rate, and structural properties of the films produced. This understanding is important for ultimate utilization of diamond film technology in the production of wear resistant coatings, high thermal conductivity semiconductors, abrasives, and optical coatings.

Project Start
Project End
Budget Start
1992-09-01
Budget End
1997-02-28
Support Year
Fiscal Year
1992
Total Cost
$455,000
Indirect Cost
Name
University of Tennessee Knoxville
Department
Type
DUNS #
City
Knoxville
State
TN
Country
United States
Zip Code
37996