This is an award under the National Science Foundation Program of Research at Undergraduate Institutions. The research emphasizes the study of the effects of hydrogen termination on the chemical nature of the surface of silicon single crystals and on the nature of interfaces between the silicon and epitaxial layers. The chemistry of the surface of the silicon will be determined using x-ray photoelectron spectroscopy, low energy electron diffraction, gas chromatography, Auger electron spectroscopy, reflection high energy electron spectroscopy, and high resolution electron microscopy. Training of undergraduate students in physics and chemistry related to electronic materials is an important feature of the grant. It is hoped that exposure of highly qualified undergraduate students to research will encourage them to opt for a career in teaching and/or research.
