This Small Business Innovation Research (SBIR) Phase I project will demonstrate an innovative photo-curable "cure on demand" room temperature preceramic polymer approach for the fabrication of high yield silicon nitride (Si3N4) and Si3N4/SiC ceramics. No photo-curable preceramic polymer to silicon nitride or any other nitride ceramic has ever been previously demonstrated. The proof of concept will be demonstrated by synthesizing and subsequently photo-cross-linking poly(ethynyl)silizane (PESZ) prior to pyrolysis. This is expected to result in a low-dielectric, low creep, high ceramic yield matrix or coating with wide applications. This represents a new core enabling technology with potential for microelectronics, thermal management, and high temperature structural applications.
Specifically, the unique combination of high strength, high temperature stability, high thermal conductivity, and unusual dielectric properties of silicon nitride lend themselves to unique applications that include hybrid circuit substrates for microwave electronics, hypersonic interceptor nose cones, and antennas. The photo-curability permits the eventual photolithographic patterning of both carbide and nitride ceramics.
