Silane is a toxic, pyrophoric gas which is used in large quantities (>150,000 lbs/yr) by the semiconductor manufacturing industry. Advanced Technology Materials (ATMI) is a world leader in the development of scrubbers, purifiers, and delivery systems for hazardous gases. In the proposed Phase I program ATMI will work with the University of Wisconsin to determine the feasibility of generating silane in a point-of-use fashion from nonhazardous precursors. The precursors are specifically designed to allow both generation of high purity silane and recycling of the chemical byproducts. The availability of a silane generation system would represent a major enhancement to the environmental safety and health of semiconductor fabrication facilities and the communities in which they are located. In the Phase II program ATMI will develop large scale synthetic procedures for the precursors and will build a prototype generator which will be used to grow high purity silicon. This will lead to commercial introduction of the system in Phase III.

Agency
National Science Foundation (NSF)
Institute
Division of Industrial Innovation and Partnerships (IIP)
Type
Standard Grant (Standard)
Application #
9460595
Program Officer
Kesh S. Narayanan
Project Start
Project End
Budget Start
1995-02-01
Budget End
1996-03-31
Support Year
Fiscal Year
1994
Total Cost
$75,000
Indirect Cost
Name
Advanced Technology Materials, Inc.
Department
Type
DUNS #
City
Cedarville
State
OH
Country
United States
Zip Code
45314