Manufacturing of future nanodevices and systems will require accurate means to pattern, assemble, image and measure nanostructures. Current interferometry is inadequate for these tasks due to sensitivity to the environment, high cost, and the large masses of the high quality mirrors that are required on moving stages. The UNC Charlotte-MIT team will research new metrology technology based on large-area grating patterns called "Nanogrids" that have long-range spatial-phase coherence and ultra-high accuracy that is 10-100 times better than the best current gratings. Nanogrids will be used to replace interferometers in nanomanufacturing tools and calibrate other dimensional scales. Two unique tools, the MIT-developed Nanoruler, which is a grating patterning and reading tool, and the UNCC-MIT developed Sub-Atomic Measuring Machine (SAMM), which is a metrology and imaging tool, will be modified to meet these new accuracy targets. The SAMM will be used to characterize errors in the Nanogrids. Nanogrids will also be used by NIST and our industrial partners and the accuracy on nanoimprinted Nanogrids will be investigated.
The results of this research will enable the commercialization of numerous new nanotechnology tools as well as educate a new generation of students in nano-precision engineering. The program will also supplement our public outreach which includes significant K-12 programming and participation.
