Clean sources of atomic chlorine are required for mechanistic studies of semiconductor etching processes. In this proposal, we describe modifications to an existing ultrahigh vacuum compatible, effusive beam, microwave discharge fluorine atom source which would alow its use as a source of chlorine atoms, and we define measurements to characterize and demonstrate its operation. The modifications are aimed primarily at reducing heterogeneous recombination of chlorine atoms on the source walls. The measurement techniques include modulated beam mass spectrometry and x-ray photoelectron spectroscopy.

Agency
National Science Foundation (NSF)
Institute
Division of Industrial Innovation and Partnerships (IIP)
Type
Standard Grant (Standard)
Application #
8660557
Program Officer
Ritchie B. Coryell
Project Start
Project End
Budget Start
1987-02-01
Budget End
1987-09-30
Support Year
Fiscal Year
1986
Total Cost
$40,000
Indirect Cost
Name
Aerodyne Research Inc
Department
Type
DUNS #
City
Billerica
State
MA
Country
United States
Zip Code
01821