This project is a collaborative study of flame assisted SiO2 formation and deposition for use in the Outside Vapor Deposition (OVD) process of forming SiO2 boules for producing optical fiber. An attractive new method, called Electrin Field Enhanced Deposition (EFED), to enhance the deposition rate of SiO2 using an electric field is a major topic of study. The scientific goal of the research is to determine scaling laws for designing optimal flame configurations and for understanding the effect of operating parameters on the deposition process. The methodology combines numerical and analytic modeling with experimental measurements. Benefits of the research include an enhanced ability to predict the effect of changing operating parameters and geometry on the deposition rate and efficiency and the potential addition of a valuable new method for enhancing deposition. Although the study focuses on the OVD process, the results should be valuable in obtaining an improved understanding of other silica deposition processes and configurations and other flame deposition processes such as silicon carbide surface hardening and titanium dioxide paint production.

Project Start
Project End
Budget Start
1990-08-15
Budget End
1993-12-31
Support Year
Fiscal Year
1990
Total Cost
$132,000
Indirect Cost
Name
University of California Berkeley
Department
Type
DUNS #
City
Berkeley
State
CA
Country
United States
Zip Code
94704