In this project, supported by the Analytical and Surface Chemistry Program, Professor Nuzzo will carry out a comprehensive study of the activated adsorption and decomposition of organometallic CVD precursors. The early stages of metallization in CVD will be explored, with emphasis on the reactive chemistry of organoaluminum reagents on oxidized and elemental silicon surfaces, and the nucleation of metal overlayers on these surfaces. Molecular beam and surface spectroscopic methods will be combined to probe the detailed mechanisms of these technologically important reactions. In addition, a generalized method for directly depositing patterned metal films will be developed using self assembled monolayer chemistry. The results of this research project will be very useful in developing an understanding of important electronic materials process chemistry. %%% The initial stages of metal thin film deposition on important electronic materials will be examined in this research project in the Nuzzo laboratory at the University of Illinois-Urbana Champaign. Detailed examination of the mechanism of organometallic precursors for chemical vapor deposition of metal layers will be carried out. Patterned film deposition will also be explored using self assembled monolayer chemistry developed in the Nuzzo laboratory.
