The intellectual merit of this project is focused on exploring the feasibility of developing a new electron-beam (e-beam) lithography technique capable of fabricating nanoscale 3-D surfaces of arbitrary shape in a systematic and reproducible manner. The technique will include state-of-the art e-beam lithographic and plasma etching processes as well as a spatial e-beam dose control scheme to achieve the desired contour.
The broader impacts of this research project will be far-reaching. The new lithographic tool (to be developed in this and subsequent projects)will enable device makers to fashion novel 3-D nanoscale device elements not previously possible. This proposed work will train graduate students in challenging new technologies that have a rapidly growing demand as well as develop skills in cutting-edge tools and techniques for nanofabrication researches. An African American female graduate student is expected to benefit substantially through this unique interdisciplinary approach to research and education not offered in more traditional programs. Finally, the knowledge gained from this research will enhance the existing courses on nanoscience and technology as well as provide a basis for a new course, Fabrication of Nano Systems.
