The objective of this research project is to establish a state-of-the-art magnetron sputtering capability to find a single unifying indicator parameter relating internal chamber conditions (e.g., ion flux) to external parameter changes (e.g., power, gas pressure). Direct current magnetron sputtering is a physical vapor deposition (PVD) technique which allows for the coating of almost all elements in the periodic table. Even though sputtering is a commonly used industrial technique, current practices rely mostly on trial and error approaches which significantly limit its broader use. By using a combinatorial design of equipment and experiments, we will enhance the general knowledge in sputtering deposition systems, which will lead to the processing of materials such as multilayers and nano-grained films.
The results of this research will allow for the processing of highly engineered microstructures which can be used for innovative applications in the fields of materials science, nanotechnology and renewable energy. Such contributions will make this PVD technique a serious contender for use in the scaling up of materials with enhanced properties (e.g. electrical, mechanical).
