Modern X-ray diffraction (XRD) equipment is requested. The capabilities of the new equipment will include a powder diffractometer with a heating stage, glancing angle incidence optics for thin film and multilayer characterization, and a dedicated double-crystal X-ray diffractometer for defect characterization of strained-layer epitaxial thin films. A study on thermal oxidation of ceramic and intermetallic matrix composites by in situ heating in an X-ray diffractometer and correlation with mechanical behavior is anticipated. Another research program that will benefit strongly from the new instrument, is analytical characterization of ceramic composites synthesized by the novel Chemical Vapor Infiltration (CVI) technique. Similarly, XRD work will be applied to chemically vapor deposited ceramic thin films for protective coating applications, as well as investigating in situ environmental reactions and microstructural changes as a function of temperature. For semiconductor thin films and multilayers, determination of phase stability and alloy formation by high temperature X-ray diffractometer is important for optimization of sequential processing steps that won't compromise device performance.
