Farouk 9310544 The study addresses the fundamental mechanisms affecting the deposition of diamond-like carbon (DLC) films by the plasma assisted chemical vapor (PACVD) process. The study will combine state-of-the-art experimental techniques and detailed numerical modeling of the process. Successful completion of the research will lead to the development of effective synthesis and characterization of DLC films produced by the PACVD process. A primary objective of the project is to develop a commercially viable coating process for depositing stress-free diamond-like thin films with a high process reproducibility on various substrates. Experimental investigations will include in-situ monitoring and control of the PACVD processes in a reactor. An advanced in-situ monitoring instrumentation package will be used to measure the key physico-chemical parameters of the plasma and the properties, stoichiometry and the stress in the film. Comprehensive numerical modeling of the process will include the consideration and interaction of the electron kinetics in the reactor, plasma chemistry of a methane based deposition system and surface reactions that affect the deposition process. The extensive measurement capabilities will provide an adequate data base for the validation and improvement of the model. Using the diagnostic capabilities and the detailed numerical model, a set of robust process parameters will be developed for scaled up industrial reactors for DLC film deposition.
