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GOALI: Rational Design of Advanced Photoresist Materials for 193 nm and 157 nm Lithography
Henderson, Clifford
SHICK, ROBERT
Ludovice, Peter
Georgia Tech Research Corporation, Atlanta, GA, United States
Search 14 grants from Clifford Henderson
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Search 9 grants from Peter Ludovice
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Abstract
TO BE ENTERED LATER.
Funding Agency
Agency
National Science Foundation (NSF)
Institute
Division of Materials Research (DMR)
Application #
0300467
Program Officer
LaVerne D. Hess
Project Start
Project End
Budget Start
2003-08-01
Budget End
2007-07-31
Support Year
Fiscal Year
2003
Total Cost
$295,786
Indirect Cost
Institution
Name
Georgia Tech Research Corporation
Department
Type
DUNS #
City
Atlanta
State
GA
Country
United States
Zip Code
30332
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