This project addresses CVD techniques based on alternative chemistries for the growth of lithium niobate (LiNbO3, LN), and related materials. The approach involves new growth chemistries combined with new reactor designs to better understand the science of oxide growth leading to the formation of a high growth rate deposition process, which will yield new oxide heterostructures. New growth chemistries in combination with new reactor designs, and the determination of reaction pathways using UHV-based surface science techniques, are expected to lead ro rational precursor design. Along with in situ characterization of the evolving growth chemistry using chemical beam epitaxy (CBE), the growth of new oxide-based heterostructures in both composition and doping, and the development of growth-chemistry-property relationships based on extensive characterization and implementation of these oxide materials within device-like structures are anticipated. This project is interdisciplinary involving chemistry and physics skills and methodology that include synthetic inorganic and organometallic chemistry, film growth precursor design, epitaxial film growth and characterization, and detailed optical device measurement capabilities. *** The project addresses fundamental materials research with strong technological relevance to electronics and photonics. Graduate and undergraduate students will be working within an interdisciplinary environment including broad chemical, chemical engineering, materials science, and device physics viewpoints. Additionally, the project strives for inclusion of students from underrepresented groups. The results of this research project will be broadly disseminated through research papers, and papers in general science and educational journals.
This project addresses CVD techniques based on alternative chemistries for the growth of lithium niobate (LiNbO3, LN), and related materials. The approach involves new growth chemistries combined with new reactor designs to better understand the science of oxide growth leading to the formation of a high growth rate deposition process, which will yield new oxide heterostructures. New growth chemistries in combination with new reactor designs, and the determination of reaction pathways using UHV-based surface science techniques, are expected to lead to rational precursor design. Along with in situ characterization of the evolving growth chemistry using chemical beam epitaxy (CBE), the growth of new oxide-based heterostructures in both composition and doping, and the development of growth-chemistry-property relationships based on extensive characterization and implementation of these oxide materials within device-like structures are anticipated. This project is interdisciplinary involving chemistry and physics skills and methodology that include synthetic inorganic and organometallic chemistry, film growth precursor design, epitaxial film growth and characterization, and detailed optical device measurement capabilities. *** The project addresses fundamental materials research with strong technological relevance to electronics and photonics. Graduate and undergraduate students will be working within an interdisciplinary environment including broad chemical, chemical engineering, materials science, and device physics viewpoints. Additionally, the project strives for inclusion of students from underrepresented groups. The results of this research project will be broadly disseminated through research papers, and papers in general science and educational journals.
