The objective of this proposed research is to investigate the deposition of superconducting and ferroelectric thin films via computer controlled dual ion beam sputter deposition. This new and evolving technology should allow deposition of high quality, multi-component oxide (not limited to oxides) films with carefully controlled stoichiometries, with homogeneous or modulated/superlattice structures, and under conditions (e.g., low temperatures) compatible with integrated device processing. Detailed characterization of the structure, chemistry, and electrical properties of the films will be done.
