9317479 Stone Strengthening mechanisms in molybdenum and tantalum/nitrogen thin films are explored using unique indentation apparatus. The film compositions are selected as model systems to examine solid solution strengthening and the Hall-Petch effect. Film thicknesses on the order of 2 to 5 microns are deposited on hard substrates. Emphasis is placed on determining the effects of indentation rate and temperature on the hardness, as a function of grain size, alloy content, and structure form. The kinetics of plastic deformation are characterized by load and depth sensing techniques and wafer curvature stress measurements. Results should permit a determination of how well laws governing the kinetics of deformation in bulk materials relate to behavior in thin films. %%% The research will provide an improved understanding of deformation phenomena in hard coatings. This knowledge can lead to new strategies for depositing thin films to achieve improved properties. ***

Agency
National Science Foundation (NSF)
Institute
Division of Materials Research (DMR)
Application #
9317479
Program Officer
Bruce A. MacDonald
Project Start
Project End
Budget Start
1994-05-01
Budget End
1998-04-30
Support Year
Fiscal Year
1993
Total Cost
$264,970
Indirect Cost
Name
University of Wisconsin Madison
Department
Type
DUNS #
City
Madison
State
WI
Country
United States
Zip Code
53715