9701488 Wang This project examines the structure and magnetic properties of epitaxial Co/Cu/Co trilayers and Co OwiresO prepared by molecular beam epitaxy (MBE). The Co and trilayer films are grown on flat and vicinal (step bunched) silicon (111) surfaces, respectively. The parameters describing the interface roughness and mixing of these Co nanostructures are determined quantitatively in situ from the angular profile measurement of diffraction beams using high resolution, low energy electron diffraction complemented with scanning electron microscopy. The coercivity, magnetic anistropy, exchange coupling, magneto resistance, and magnetic inhomogeneity are obtained in situ from the surface magneto-optic Kerr effect (SMOKE), ferromagnetic resonance, and the Van der Pauw method. Atomic force microscopy and magnetic force microscopy provide important information on morphology and magnetic domain wall structures. In addition the temperature dependence and magnetic stability of these nanostructures are studied. %%% The quantitative relationship between interface roughness and magneto resistance and magnetic exchange coupling and their temperature dependence will permit an optimization of the trilayer that has the largest and thermally stable magneto resistance at very low magnetic fields. Such materials have applications in magnetic read heads for ultrahigh density hard disk drives. ***

Agency
National Science Foundation (NSF)
Institute
Division of Materials Research (DMR)
Application #
9701488
Program Officer
K. Linga (KL) Murty
Project Start
Project End
Budget Start
1997-08-15
Budget End
2001-07-31
Support Year
Fiscal Year
1997
Total Cost
$125,960
Indirect Cost
Name
Rensselaer Polytechnic Institute
Department
Type
DUNS #
City
Troy
State
NY
Country
United States
Zip Code
12180