The objective of this research is the acquisition of a modern Inductively Coupled Plasma etching tool with submicron dimension control. Multiple research projects at the University of Cincinnati require a submicron etch capability, in areas ranging from photonic device and biosensor fabrication to etching for basic physics research. The approach is to combine the etch capability of the ICP etcher with the recently acquired and fully functioning Raith 150 e-beam lithography tool, to enable expanded research efforts in micro- and nanofluidics, sensors and devices. Intellectual Merit. This equipment acquisition will contribute to meeting the University of Cincinnati's research and educational goals. Central goals of the University strategic plan are to grow our research excellence by developing research and discovery, and to place Students at the Center ?and thus enhance the university's ability to attract the highest-quality students. The requested etch system will expand the research capabilities for a wide range of faculty and literally scores of graduate students in their thesis and dissertation research, and would expose undergraduates and summer program students to state-of-the-art fabrication techniques. Broader Impact. Acquisition of the Inductively Coupled Plasma etcher will enhance educational opportunities for both graduate and undergraduate students. It will have a direct and strong impact on the development and training of our nation's future scientists and engineers in nanoscale science and engineering, a critical segment of the nation's workforce. Undergraduate students are exposed to the nanoscale science through a series of structured laboratory experiments integrated with an existing NSF Nanotechnology Undergraduate Education program. Significant collaborative efforts currently exist between the University of Cincinnati, Xavier University (an undergraduate institution), Miami University, and the University of Dayton.
