Research Initiation: Simultaneous Formation of Polycide Interconnects, Silicide Contacts, and Shallow P-N Junctions by Ion Beam Mixing and Rapid Thermal Annealing

Kwong, Dim-Lee

Abstract

Funding Agency

• Agency: National Science Foundation (NSF)
• Institute: Division of Electrical, Communications and Cyber Systems (ECCS)
• Type: Standard Grant (Standard)
• Application #: 8596003
• Program Officer: Cassandra M. Queen
• Budget Start: 1986-11-30
• Budget End: 1987-05-31
• Fiscal Year: 1985
• Total Cost: $35,951

Institution

• Name: University of Notre Dame
• City: Notre Dame
• State: IN
• Country: United States
• Zip Code: 46556