Processing induced defects will pose an ever increasing problem in VLSI-ULSI because processes involving ionizing radiation will become more prevalent. Unfortunately, scientists with an interest in defects in insulators tend to be divided amongst those who use electrical characterization techniques, and those who use nonelectrical methods of analysis such as EPR, ESR, and XPS. The former group include physicists, and solid state electrical engineers, while the latter group include material scientists and classical chemists. The two groups very rarely have a common forum for interchange of ideas and much valuable information is lost to each of these groups because of this. In addition, there is another group, that concerned with RAD hard materials, who speak to neither of the aforementioned groups. The purpose of the presently proposed workshop entitled, "The First Workshop On Process-Related Electrically Active Defects in Semiconductor-Insulator Systems", is to bring together this mixture of scientists with varying backgrounds, but related interests.
