Metalorganic chemical vapor deposition of metallic oxides is an established technology in the electronics industry for production of thin film insulators and transparent conductors with tailored properties. Applied to the new superconducting ceramic materials this process could produce films in oxygen which do not require sintering, films which may grow epitaxially on single crystal substrates and films of exceptionally high purity with uniform composition and crystal phases. The objective of Phase I is to demonstrate that metalorganic chemical vapor deposition of yttrium-barium-copper-oxide on zirconia, alumina, coated alumina or strontium titanate yields a uniform superconducting film with a smooth surface.

Agency
National Science Foundation (NSF)
Institute
Division of Industrial Innovation and Partnerships (IIP)
Type
Standard Grant (Standard)
Application #
8861267
Program Officer
Darryl G. Gorman
Project Start
Project End
Budget Start
1989-01-01
Budget End
1989-09-30
Support Year
Fiscal Year
1988
Total Cost
$49,962
Indirect Cost
Name
Spire Corporation
Department
Type
DUNS #
City
Bedford
State
MA
Country
United States
Zip Code
01730