Microlithography Chemical Company plans to conduct a synthetic research program to explore a new synthetic and manufacturing approach for the development of advanced novolak resins for microelectronic, printed circuit board, and LCD applications. More precisely, an evaluation of scientifically designed novolak resins with superior properties and reproducibility, specifically applicable for use in positive photoresists will be undertaken. These resins would be designed based on recently published work on the hydrogen bonding interactions between novolaks and photosensitive components of the resist. They would also be designed to give higher dissolution rates, improved thermal stability, better batch-to-batch reproducibility, and very low metal ion contamination. We plan to undertake an experimental program and develop a new synthetic approach, prepare discrete low MW oligomeric components, and to convert these oligomers into a series of block copolymer resins to be evaluated for relevant performance. MCC will carry out a program which could lead to the development of solid novolak resins with less than 100 ppb metal ion and 10% batch-to-batch reproducibility, and which are capable of providing resists with better than 0.5 m resolution, approximately 100 mJ/cm2 threshold energy, and at least 130 C thermal stability.
