Thin film passive waveguide are key elements of integrated optical circuits. If the benefits of optical fiber communication are to widely available, thin film waveguides must be manufactured rapidly, reliably and cheaply. This cannot be done now. In Phase I we used our proprietary, environmentally sound Jet Vapor Deposition (JVD) process to make an unusual starting material: a ceramic host film doped with an organic dye guest; this was then photo- patterned, producing a working thin film waveguide. JVD followed by photo-patterning has the potential for high throughput, inexpensive production. JVD ceramic-organic host-guest films, produced at high rate, in unlimited variety, and at room temperature, have excellent optical, chemical and mechanical properties for integrated optics. Accordingly, the JVD + photo-patterning strategy can i) provide a new class of materials useful for integrated optics and compatible with electronic ICs and ii) open the way to high volume manufacture of integrated optic circuits. In Phase II we will investigate the optical properties of JVD dye- doped ceramic films, fabricate devices from them, e.g., directional couplers and filters, demonstrate JVD linking of an optical fiber to a thin film waveguide, and implement laser photo-patterning . Our Phase II research will provide both fundamental advances in photonic materials and new approaches to integrated optics manufacturing. **

Agency
National Science Foundation (NSF)
Institute
Division of Industrial Innovation and Partnerships (IIP)
Type
Standard Grant (Standard)
Application #
9303207
Program Officer
Kesh S. Narayanan
Project Start
Project End
Budget Start
1993-09-15
Budget End
1996-02-29
Support Year
Fiscal Year
1993
Total Cost
$300,000
Indirect Cost
Name
Jet Process Corporation
Department
Type
DUNS #
City
New Haven
State
CT
Country
United States
Zip Code
06511