This research program concentrates on studies of collision processes relevant to the physics and chemistry of low- temperature plasmas used in processing. Four different areas of emphasis are pursued: collisional and spectroscopic studies involving silicon-organic compounds; LIF studies of neutral ground-state dissociation fragments; electron collisions with C-60 and C-70; and modeling of plasma-wall interactions and wall recombination processes. The results of the work will contribute to the fundamental understanding of basic plasma processes as well as provide information necessary for the utilization of plasmas in processing applications.
