In this project supported by the Chemistry Division and the Division of Chemical and Transport Systems under the NSF/DOE Partnership in Basic Plasma Science and Engineering, Cosby will measure electron-impact dissociation cross sections of molecules and radicals important for plasmas at electron energies between the dissociation threshold and 200 eV. Absolute cross sections, product translational energy distributions, and product identifications will be determined for a number of small molecules and radicals, including CFx, NFx, SiFx, BFx (where x = 1-3), BCl2, BCl3, NO, N2O, SO, and SO2. The measurements will be made in a crossed electron beam-fast neutral beam apparatus. Plasmas are used to process critical materials in the electronics, aerospace, automotive, steel, biomedical, and toxic waste management industries. Therefore, it is important to be able to describe a plasma and its complex interactions with materials. The data gathered in this project will provide input into models of plasma which will allow the processing steps used in semiconductor fabrication and other areas to be improved and optimized.
