This award provides funding to support 20 graduate students to attend the 54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabricaton 2010 to be held in Anchorage, Alaska, June 1-4, 2010. The conference is organized by the American Vacuum Society, the Electron Devices Society of the IEEE, and the Optical Society of America.
The opportunity provided by this funding will blend research and educational activities for the graduate students who attend. By participating in the conference, the graduate students will be exposed to state-of-the-art research topics and will interact with global academic and industrial leaders.
The objective of this grant was to provide partial support for student travel to the 2010 International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN) held in Anchorage, Alaska June 1 to 4, 2010. This conference is the premier international venue for presentation of the most up to date results in nanofabrication and applications of nanofabrication. The grant of $10,000 from the NSF enabled 14 graduate students to attend the conference and present their research results to an international conference containing the leaders in the field of nanofabrication. The research results of these students were published in the Nov./Dec. issue of the Journal of Vacuum Science and Technology, an archival publication of the American Institute of Physics. In addition to the funds received from the NSF, $15,000 was received from the Department of Energy, $2,500 from industry and $27,500 from the EIPBN 10 conference chairperson. Altogether, 66 students received financial aid for travel to the conference. Following is list of the papers published by students as a result of their presentations at the EIPBN 10 conference. 28 Published Papers from EIBPN Student Grant Recipients at US Universities Robust estimation of line width roughness parameters, Kedar Patel, Soumendra N. Lahiri, and Costas J. Spanos, J. Vac. Sci. Technol. B 28, C6H18 (2010); doi:10.1116/1.3517718 Hole mobility enhancement by chain alignment in nanoimprinted poly(3-hexylthiophene) nanogratings for organic electronics, Min Zhou, Mukti Aryal, Kamil Mielczarek, Anvar Zakhidov, and Walter Hu, J. Vac. Sci. Technol. B 28, C6M63 (2010); doi:10.1116/1.3501343 Nanoimprinted P3HT/C60 solar cells optimized by oblique deposition of C60, Yi Yang, Mukti Aryal, Kamil Mielczarek, Walter Hu, and Anvar Zakhidov, J. Vac. Sci. Technol. B 28, C6M104 (2010); doi:10.1116/1.3517513 Three-dimensional microfluidic mixers using ion beam lithography and micromachining, E. Palacios, L. E. Ocola, A. Joshi-Imre, S. Bauerdick, M. Berse, and L. Peto, J. Vac. Sci. Technol. B 28, C6I1 (2010); doi:10.1116/1.3505128 Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist, Huigao Duan, Donald Winston, Joel K. W. Yang, Bryan M. Cord, Vitor R. Manfrinato, and Karl K. Berggren, J. Vac. Sci. Technol. B 28, C6C58 (2010); doi:10.1116/1.3501353 Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale, Huigao Duan, Vitor R. Manfrinato, Joel K. W. Yang, Donald Winston, Bryan M. Cord, and Karl K. Berggren, J. Vac. Sci. Technol. B 28, C6H11 (2010); doi:10.1116/1.3501359, Online Publication Date: 22 November 2010 Nondestructive detection of deviation in integrated circuits, Leili Baghaei, Bing Dai, Piero Pianetta, and R. Fabian W. Pease, J. Vac. Sci. Technol. B 28, C6Q25 (2010); doi:10.1116/1.3518464 Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist, Huigao Duan, Donald Winston, Joel K. W. Yang,
