The objective of this EArly-concept Grant for Exploratory Research (EAGER) is to demonstrate that the laser-induced plasmonics would improve resolution, increase throughput and reduce cost of nanolithography processes and will be superior to the existing grating-based, mask-containing plasmonic systems. A nanosecond pulsed Nd:YAG laser beam will be enlarged and impinged on a unique plasmonic lens that consists of nanoporous alumina deposited with silver to generate and transmit plasmons; the constructive interference of the plasmons in the near field can create numerous nanodots on the silicon substrate. A piezoelectric actuator nanopositioning system will then be utilized to move these nanodots in direct-writing fashion to pattern the resist or etch silicon and fabricate copious two dimensional nanopattern of arbitrary shapes in a high-speed, massively-parallel manner. The proposed research represents an unprecedented application area for basic science as well as practical contributions learned from how laser-induced plasmons interact with materials, and what feature sizes and capabilities can be obtained.
The novel nanolithography system proposed in this study has potential to advance the capabilities of lithography required in high-density integrated circuit device fabrication and for producing nanoscale devices for microelectronics, MEMS, tribology, optics, electro-optics, magnetics, communication, and medicine. The educational efforts include recruitment and participation of woman and/or underrepresented student in the research and assimilation of the research outcomes into a cutting edge laboratory for the undergraduate manufacturing course.
In this EAGER (EArly-concept Grants for Exploratory Research) grant, a proof-of-concept for a simpler yet high throughput plasmonic system for nanomanufacturing of silicon such as patterning the SU8-photoresist and synthesizing gold nanoparticles on silicon substrate is presented. The intellectual merits of the study are harnessing the energy from plasmon polaritons by effectively "customizing" and controlling their propagation and an improved understanding of plasmon-material interactions. The engineering contribution is the development of a novel nanomanufacturing system that has potential for high density patterns of <100 nm features. Essentially we have extended the current capabilities of plasmonic nanolithography by adding a high intensity light source for creating high density plasmons; an easy-to-fabricate, inexpensive and durable plasmonic mask based on electrochemically etched nanoporous alumina; and a new control scheme of piezo-nanopositioning for achieving massive-parallel, high throughput lithography. The broader impacts are in the semiconductor industry where this new nanolithography system can supersede many tip-based nanomanufacturing technologies and also stimulate industrial developments for achieving extreme size features. The method investigated in EAGER grant is simpler, quicker, energy efficient, contamination-free and environmentally safer than many other methods and can be extended to all types of materials that will in turn allow for new possibilities in the formation of nanostructured surfaces. Two graduate students pursuing MS degrees were financially supported.
