The project will investigate the physical principle underlying the plasma-assisted laser deposition process for the in situ growth of high critical temperature superconducting thin films on a substrate. An understanding of the physical mechanisms governing the process are critical for reproducible thin film deposition on a low temperature substrate and subsequent integration into existing semiconductor technologies. The successful modeling and control of the deposition process may allow the manufacture of superconducting thin films with the consistent properties that are needed to produce devices that are of practical usefulness.
