9500390 Patterson This award supports a new concept in precision metrology, the Extreme Ultraviolet Optics Measuring Machine (EUVOMM). The goals for this system when used to measure optical surfaces are a diameter range of 250 mm with a lateral accuracy of 3.3 nm rms, and a depth range of 7.5 mm with a depth accuracy of 0.33 nm rms. This can be achieved using design and integration of several precision engineering and optical technologies: precise motion control, reduction of systematic errors in heterodyne interferometry, and atomic force microscopy as the sensing probe. The tasks supported by this award are: system optimization, study of the scaling of elastic mechanisms, and implementation of the analysis results in an experimental high-precision slide drive system. This work will complement, and is in part be supported by, work at Lawrence Livermore Lab's Manufacturing Technologies Program. This research will provide the technical basis for fabrication and testing of diffraction limited optical systems operating in the ultraviolet or soft x-ray region. This will lead to a new generation of instruments for research and fabrication in the semiconductor industry. ***
