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Research Initiation: Simultaneous Formation of Polycide Interconnects, Silicide Contacts, and Shallow P-N Junctions by Ion Beam Mixing and Rapid Thermal Annealing
Kwong, Dim-Lee
University of Notre Dame, Notre Dame, IN, United States
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Abstract
Funding Agency
Agency
National Science Foundation (NSF)
Institute
Division of Electrical, Communications and Cyber Systems (ECCS)
Type
Standard Grant (Standard)
Application #
8596003
Program Officer
Cassandra M. Queen
Project Start
Project End
Budget Start
1986-11-30
Budget End
1987-05-31
Support Year
Fiscal Year
1985
Total Cost
$35,951
Indirect Cost
Institution
Name
University of Notre Dame
Department
Type
DUNS #
City
Notre Dame
State
IN
Country
United States
Zip Code
46556
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