This research seeks to improve the resolution of microphotographic systems by developing algorithms for the introduction of modifications in masks to compensate for distortions introduced by optical systems. Applications of such work include microfilming, laser printing, microlithography for IC fabrication, and design of aids for the visually impaired. This work will develop techniques for finding masks and testing obtained resolutions using computer-generated holograms. This research renews previous research conducted under grant no. ECS-8306340.
