The goals of the proposal research are to (1) develop key technologies in two critical areas of nanofabrication: ultra-high resolution electron beam lithography and reactive ion etching; (2) use the existing nanofabrication technologies (sub-30 nm) developed in the PI's group to fabricate various innovative high- speed nanoscale devices, such as lateral resonant tunneling transistors, quantum waveguide transistors, and single electron transistors; and (3) use these devices as research vehicles to study ballistic, quantum transport, and Coulomb blockade in nanometer devices, develop new device concepts, and explore new device functions and revolutionary IC architectures.
