9602503 Pang This award supports U.S.-Japan collaborative research between Dr. Stella Pang of the Department of Electrical Engineering and Computer Science at the University of Michigan and Dr. Toshiaki Tamamura of the Photonic Functional Device Laboratories at NTT in Kanagawa, Japan. Dr. Pang will be supported for six months at NTT in order to develop and apply advanced nanofabrication technology for optoelectronic devices to semiconductor mirrors, waveguides, and lasers. The effects of processing technology on the device characteristics and reliability will be studied. Techniques such as in-situ passivation and epitaxial overgrowth to remove or minimize process induced defects will be developed. Comparisons will be made between quantum dots that are formed by self-organized technique and by damage free dry etching technique. The U.S. researcher brings to this collaboration her knowledge of low damage dry etching, surface passivation, in- situ monitoring and process control, and Si-based optical modulators. This is complemented by expertise in the area of high resolution electronic beam lithography, epitaxial growth of strained layers and self-organized quantum structures, and optical characterization of devices by the Japanese researcher. The project is expected to result in new or improved processing technology related to lithography, etching, material growth, and device integration. In addition, the new technology will increase the design flexibility and allow new high performance optoelectronic devices to be improved and developed. It is expected that the cooperation between these laboratories should foster future collaborations.
