This three-year award supports U.S.-France cooperative research in X-ray lithography between Franco Cerrina at the University of Wisconsin and Huguette Launois of Laboratory for of Microstructures and Microelectronics at the French National Center for Scientific Research. The project includes travel support for Dr. Cerrina's graduate students. The objective of the research is to study the limits of X-ray lithography by taking advantage of E-beam lithography and a tungsten process developed in Dr. Launois' laboratory. The project will advance our knowledge of X-ray lithography and has relevance to the microelectronics industry.
