The proposed center's goal is to develop state of the art techniques for micro and nanoscale contamination control, removal and characterization in manufacturing and fabrication processes. The center will contribute to the competitiveness of the semiconductor, information technology, pharmaceutical, imaging, aerospace and other industries affected by particulate and ionic contamination. The center will especially focus on surface cleaning of patterned, structured and flat substrates. Faculty in the center have identified mechanisms to effectively clean ionic contamination from patterned wafers.

Project Start
Project End
Budget Start
2001-08-01
Budget End
2002-07-31
Support Year
Fiscal Year
2001
Total Cost
$10,000
Indirect Cost
Name
Northeastern University
Department
Type
DUNS #
City
Boston
State
MA
Country
United States
Zip Code
02115