The Small Business Innovation Research (SBIR) Phase I project will expand the applicability of embedded electron charge technology by developing new techniques to store a large amount of electron charge at the interface of dissimilar insulators. Since electron injection using high electric fields will not work for thin films deposited on thick insulating substrates, alternative means must be developed for charge injection. Charge injection samples for this project will be fabricated by depositing alternating thin film layers of silicon dioxide and silicon nitride on thick fused silica substrates. The silicon nitride will be deposited using Low Pressure Chemical Vapor Deposition (LPCVD) process, while the silicon dioxide will be deposited using several methods.

The proposed technology will allow a much broader product scope with mid-to-macro size applications, far beyond the present limitations of embedded charge micro devices. Applications include energy harvesting for personal power from heel strike from walking, modules for providing power for sensors throughout a vehicular system, and eventually exoskeleton energy harvesters for converting body motion to usable electrical power, greatly benefiting both military and civilian users.

Project Start
Project End
Budget Start
2007-01-01
Budget End
2007-09-30
Support Year
Fiscal Year
2006
Total Cost
$99,913
Indirect Cost
Name
Elecsci Corporation
Department
Type
DUNS #
City
Rochester
State
NY
Country
United States
Zip Code
14623