The objective of this program is to synthesize a thin film multilayer composite material with a magnetoresistive effect up to ten times the magneto-resistance ratio of permalloy material. A composite iron-chromium multilayer with 25% room temperature magnetoresistive ratio has been made by molecular beam epitaxy techniques. This program will build on that work, but will provide a soft magnetic composite material with low magnetostriction and temperature coefficient of resistance, which are essential for practical applications. The multilayers will be sputtered for fast turnaround, alloy composition control, and may result in rapid commercialization.