This project concerns the development and evaluation of a portable on-line x-ray diffraction system for in-situ monitoring of critical material properties in thin film vapor deposition systems. An available x-ray type transducer, the position sensitive scintillation detector, will be modified for use in sputter reactor environments. Issues to be addressed include the thermal and physical isolation of the device from the reactor environment, while retaining its positioning flexibility. The feasibility of using the modified system for in-situ x-ray diffraction monitoring of sputtered film growth will also be evaluated. Successful in-situ monitoring of critical microstructural material properties would greatly enhance process control in a wide variety of manufacturing processes involving solid state crystalline materials processing. Such a device would also be useful in on-line non-destructive inspection and quality control.
