This Small Business Innovation Research Phase I project is focused on the development of a low-cost on-line sensor for rapid on-site analysis to measure trace metallic contaminants in process chemicals commonly used in semiconductor manufacturing. Detection and quantitation of trace heavy metal contamination in MOS integrated circuit fabrication is of great importance becoming even more critical as device geometries are scaled. At present, all such analyses are carried out off-line, involving sampling of process fluids and analysis using costly laboratory equipment, remote from the fab line. This approach causes lengthy and costly delays making on-line or at least `in-fab` methods extremely desirable. ChemTrace Corporation proposes to apply a novel anodic stripping voltammetry system to provide a low cost, on-line solution to this problem. Their approach involves a micromachined iridium microelectrode array on silicon and a single-chip, full-featured potentiostat which (when combined with a low-cost microcontroller chip) can be directly interfaced to a personal computer's serial port. This approach will reduce analysis latencies from many hours to minutes and provide unprecedented flexibility and early warning capability for contamination.

Agency
National Science Foundation (NSF)
Institute
Division of Industrial Innovation and Partnerships (IIP)
Type
Standard Grant (Standard)
Application #
9461869
Program Officer
Darryl G. Gorman
Project Start
Project End
Budget Start
1995-02-01
Budget End
1996-07-31
Support Year
Fiscal Year
1994
Total Cost
$64,501
Indirect Cost
Name
Chemtrace CO
Department
Type
DUNS #
City
Hayward
State
CA
Country
United States
Zip Code
94545