9523182 Wu This research uill focus on the development of ultrahigh sensitivity chemical analysis of the surface and near-surface regions of solid materials. It will determine the feasibility of developing innovative mass spectrometry techniques based on laser ablation and subsequent nonresonant laser photoionization processes above the surface, coupled with high performance time-of-flight mass spectrometry. Two primary goals of this research are spatial resolution chemical imaging and sub-ppm sensitivity semiconductor surface impurity analysis. The potential applications of this research include a highly improved surface analytical instrumentation and the establishment of a dedicated analytical facility for material characterizations. Markets for this instrumentation include semiconductor manufacturers, environmental testing laboratories, and biological research institutions
