ABSTRACT EEC-9708324 Ringo The performance of submicron CMOS components like transistors, resistors and capacitors are usually limited by the parasitic substrate elements. Past processing micromachining techniques can be employed to physically remove the cause of some of these parasites. This three-year continuing award will study the development of micromachining techniques to enhance the performance of mixed-signal circuits in a submicron CMOS technology. During the first two years, a set of primitive devices will be developed using an advanced micromachining process to be performed at the Washington Technology Center. The devices will be characterized to determine design rules and device models suitable for mixed-signal circuit simulation. In the second and third year, primitive circuit blocks will be built to determine reliability and characterize the improvement in the circuit operation. Research results will include the design rules and the specification necessary for the two past processing micromachining techniques developed to eliminate parasitic substrate elements.
