In the past two years we accomplished advances. The first is to create the first hard x-ray gratings of 200 nm period that can be used to construct a highly sensitive x-ray phase contrast imaging device;the second is to develop the second generation gratings of higher quality and much reduced cost for use in bench-top systems. The first milestone was reached in collaboration with prof. Douglas Wolfe of Penn State University, leading to an ultra-sensitive imaging system on the 2-BM-B beamline of the Advanced Photon Source of Argonne National Laboratory in collaboration with Dr. Francesco De Carlo. The second milestone was reached in collaboration with Nanofab Facility of CNST, NIST. The second generation gratings are being tested in our laboratory at NIH.
| Mirzaeimoghri, Mona; Morales Martinez, Alejandro; Panna, Alireza et al. (2018) Nano-printed miniature compound refractive lens for desktop hard x-ray microscopy. PLoS One 13:e0203319 |
| Miao, Houxun; Chen, Lei; Mirzaeimoghri, Mona et al. (2016) Cryogenic Etching of High Aspect Ratio 400 nm Pitch Silicon Gratings. J Microelectromech Syst 25:963-967 |
| Znati, Sami A; Chedid, Nicholas; Miao, Houxun et al. (2015) Electrodeposition of Gold to Conformally Fill High Aspect Ratio Nanometric Silicon Grating Trenches: A Comparison of Pulsed and Direct Current Protocols. J Surf Eng Mater Adv Technol 5:207-213 |
| Miao, Houxun; Gomella, Andrew A; Chedid, Nicholas et al. (2014) Fabrication of 200 nm period hard X-ray phase gratings. Nano Lett 14:3453-8 |
| Wen, Han; Wolfe, Douglas E; Gomella, Andrew A et al. (2013) Interferometric hard x-ray phase contrast imaging at 204 nm grating period. Rev Sci Instrum 84:013706 |
