In previous years we developed fabrication technologies of nanometric structures having high aspect ratios for producing hard x-ray phase gratings of 200 and 400 nm periods. This year we enlarged the size of such components from 1 mm tall to 10 mm tall. We also began the work on high aspect ratio x-ray optics in silicon and polymer materials for x-ray microscopy using widely available compact x-ray sources. Micro and nano fabrication development is costly in nature but sets the pace for the development of new imaging methods and devices. It is the enabling factor in our effort to realize a new generation of x-ray imaging devices.
| Mirzaeimoghri, Mona; Morales Martinez, Alejandro; Panna, Alireza et al. (2018) Nano-printed miniature compound refractive lens for desktop hard x-ray microscopy. PLoS One 13:e0203319 |
| Miao, Houxun; Chen, Lei; Mirzaeimoghri, Mona et al. (2016) Cryogenic Etching of High Aspect Ratio 400 nm Pitch Silicon Gratings. J Microelectromech Syst 25:963-967 |
| Znati, Sami A; Chedid, Nicholas; Miao, Houxun et al. (2015) Electrodeposition of Gold to Conformally Fill High Aspect Ratio Nanometric Silicon Grating Trenches: A Comparison of Pulsed and Direct Current Protocols. J Surf Eng Mater Adv Technol 5:207-213 |
| Miao, Houxun; Gomella, Andrew A; Chedid, Nicholas et al. (2014) Fabrication of 200 nm period hard X-ray phase gratings. Nano Lett 14:3453-8 |
| Wen, Han; Wolfe, Douglas E; Gomella, Andrew A et al. (2013) Interferometric hard x-ray phase contrast imaging at 204 nm grating period. Rev Sci Instrum 84:013706 |
