Contamination of microelectronic components by submicron particles has become a growing concern as the industry strives to reduce the size of components and to increase their capacities. Furthermore, several processes in pharmaceutical manufacturing require total isolation from even the clean-room enviornment and requires the use of isolation chambers. Fine particles are also important in a number of industrial processes such as photography and electgro-photography and magnetic, biochemical, and agricultural processings. The International Symposium will provide a very effective forum to deal with fine particles in all of the stated processes. Furthermore, a workshop will also be conducted to determine research needs and priorities in these areas. Workshop proceedings will be widely distributed. Eight symposia/workshops are planned to be held at the annual meeting of the Fine Particle Society, San Francisco, July 28-August 1, 1986.
