This research project, supported by the Analytical and Surface Chemistry Program, examines the detailed interaction of metal ions and solid surfaces. Hyperthermal aluminum, silicon, and nickel ions are scattered from metal and semiconductor surfaces prepared and characterized in ultra-high vacuum. Both symmetric (ion and surface same element) and asymmetric (ion and surface different element) scattering measurements are carried out. Direct measurement of the charge state distribution and the probability for inelastic excitation of the incident ion is accomplished. Professor Jory Yarmoff and his collaborator Professor Zdenek Sroubek at the University of California-Riverside combine experimental studies of these ion-surface interactions with molecular dynamics and electronic structure calculations to interpret the detailed results. This information is important for a number of ion based analytical and process applications.
The scattering of metal and semiconductor ions from metal and semiconductor surfaces is the focus of this research project. Charge exchange and electronic excitation of the incident ion is examined, both experimentally and computationally. Clean and adsorbate modified surfaces are examined in these studies. The results of this work are important to surface analytical and materials processing applications.
