Diamond films and diamond-like films have in recent years been processed in a variety of ways, from complex low pressure chemical vapor deposition chambers to rather more direct thermal plasma techniques. The latter, while apparently simpler in principle, is, in fact, not readily understood nor optimized. It is important to note that the diamond films in question have attributes which make them exceptionally attractive for applications ranging from hard tool surfaces to microelectronics. The University and an industrial partner will cooperate to develop processing programs using advanced thermal plasma spray technology to form such diamond films having industrial utility. The project will produce a unique thermal plasma system, operating at a relatively low power level (20 KW and below) and processing methane and hydrogen gases.
