This project plans to conduct fundamental research on the molecular design of novel and highly sensitive inorganic/organometallic photoinitiators, elucidation of the mechanism of initiation, and evaluation of new radiation-sensitive materials for photolithographic applications in microelelectronics. The scope of research includes new classes of photoresponsive materials possessing improved thermal stability, photosensitivity, and wavelength response. %%% Knowledge gained from these studies will aid in the design of new generation photosensitive materials required to satisfy the increasingly demanding needs of the microelectronics, coatings, and reprographic industries.
