9512425 Gilliland An advanced materials processing facility will be established at Emory University which will complement existing surface, electrical, and optical characterization capabilities in the physics and chemistry departments. The processing instrumentation, consisting of an electron beam evaporator, a lithographic mask aligner, and a surface profilometer, will be utilized to process and fabricate simple devices and to characterize small structures based on compound semiconductor thin films. Research programs which will make use of the processing instrumentation include electric field effects on photoexcited carriers in III-V compound semiconductors, fundamental studies as well as fabrication of high speed photodetectors, processing and characterization of wide bandgap III-V nitride films grown by organometallic epitaxy, and development of multiple point metal film probes for thermal anemometry studies of turbulence. %%% Emory has established sizable research efforts focused upon the optical and electrical characterization of semiconductor structures. Despite this investment in human resources and in characterization equipment, a materials preparation and processing capability is lacking. The processing instrumentation will provide the researchers with the necessary tools to conduct a vigorous research effort focused on the physics and chemistry of semiconductor microstructures. ***
