9526165 Xu This research project uses a unique combination of precursor molecular structure and reaction dynamics to conduct deposition and growth studies of multi-component ferroelectric oxides. The investigation focuses on autostoichiometric vapor depostion, which takes advantage of the stoichiometrically associative double alkoxide precursors, and deposition reactions that allow for the conservation metal-to-metal ration during deposition. Basic understanding of various gas phase and surface reactions, such as free-radical pyrolysis, hydrolysis-assisted pyrolysis and hydrolysis-polycondensation, and their implications on the stoichiometric nature of thin and thick film deposition of ferroelectric materials. Characterization methods employed include mass spectrometric, X-ray, as well as optical scattering and loss measurements of waveguide structures fabricated during the project. %%% The knowledge and understanding gained from this research project is expected to contribute in a general way to improving the performance of advanced ferroelectric materials and optoelectronic components used in computing, information processing, and telecommunications by providing a fundamental understanding and a basis for designing and producing improved materials. An important feature of the program is the integration of research and education through the training of students in a fundamentally and technologically significant area. ***
